Scientific Instruments

Electron Microscope General

Products
Transmission Electron Microscope (TEM)
High resolution obsrvation and structural anlaysis of the atomic level, elemental analysis of micro to nano area are possible.
Transmission Electron Microscope (TEM)
Scanning Electron Microscope (SEM)
Mainly, observation of surface structure and elemental analysis can be performed.
Scanning Electron Microscope (SEM)
Ion Beam Application Equipment
Precise specimen preparation is possible. Simultaneous obesrvation and analysis can even be possible depending on the model and attachment.
Specimen Preparation Equipment (CP)
MultiBeam System (FIB)
Instruments for Microarea and Surface Analysis
It analyzes the detailed state of elements contained in the micro to nano area or substance surface.
Electron Probe Microanalyzer (EPMA)
Auger Microprobe (Auger)
Photoelectron Spectrometer (ESCA)
X-ray Fluorescence Spectrometer
It can analyze the kind and content of element in various samples such as solid, powder, liquid, and thin film, without the need of a reference specimen.
X-ray Fluorescence Spectrometer
Others
Electron diffractometer is introduced.
 

Magnetic Resonance Spectrometer General

Products
Nuclear Magnetic Resonance Spectrometer (NMR)
NMR is the abbreviation for Nuclear Magnetic Resonance. It is an instrument used to observe the resonance phenomenon of nuclear spins by placing atomic nuclei in the magnetic field to analyze molecular structure of a substance at an atomic level. Specifically, it is useful in the analysis of organic compounds and polymer materials and used in the fields of pharmaceutical, biology, food, and chemistry. The application is even recently expanding to include the analysis of structural and physical properties of inorganic materials such as ceramics and batteries.
NMR Probes
With NMRs, the detector (probe) differs depending on the sample form and measurement technique. JEOL offers solution and solid probes for a wide variety of purposes.
NMR Magnets
Space-saving design with a compact superconducting magnet.
Greater flexibility of installation layout of the instrument is possible with the new compact magnets that have a smaller stray magnetic field.
NMR Peripherals
Introducing NMR peripherals such as the Auto Sample Changer and Nitrogen Replenishment System.
NMR Software
Introducing software used for NMR.
Electron Spin Resonance Spectrometer (ESR)
Electron Spin Resonance (ESR) is a powerful analytical method to detect, analyze and determine thecharacteristics of unpaired electrons in a substance. It is clear that the state of electrons in a substance have a strong influence on its characteristics and functionality, so evaluation by ESR is becoming more and more important. Many types of substances, from electronic materials to catalysts, biological samples, can be studied regardless of whether they are solid, liquid, or gas. A wide range of ESR techniques are possible using suitable attachments together with the basic instrument.
ESR Peripheral Equipment
We have ESR attachments and consumables that can make a versatile measurement possible.
 

Mass Spectrometer General

Electron Beam Lithography System
Electronic devices such as computers, smartphones, and home appliances have semiconductor parts called LSIs (Large Scale Integration Circuits) built in. As miniaturization and density have progressed, the LSI circuits have come to be written with very fine patterns, and today they are as small as 10 nanometers (1/10,000th of a hair) or less.
Electron beam lithography systems are necessary to precisely process such extremely fine circuits.
As the demand for semiconductors further expands with the realization of the IoT society and the arrival of the 5G era, electron beam lithography systems are expected to play an increasingly important role.
Products
JBX-8100FS Series
Electron Beam Lithography System
JBX-9500FS
Electron Beam Lithography System
JBX-3200MV
Electron Beam Lithography System
JBX-3050MV
Electron Beam Lithography System


JEM-ACE200F
High Throughput Analytical Electron
Microscope
Features
Specifications
Application
More Info
Contacts
The JEM-ACE200F is an electron microscope responding to the system allowing for an operator to obtain data without operating the electron microscope by creating recipes for operation workflow.
Since the JEM-ACE200F inherits hardware technologies of the JEM-ARM200F high-end TEM and the JEM-F200 multi-purpose FE-TEM, this new high throughput analytical electron microscope provides superbly high stability and analytical capabilities with a renewed sophisticated exterior design.


JSM-IT800
Schottky Field Emission
Scanning Electron Microscope
Features
Specifications
Catalogue Download
Application
Related Products
More Info
Contacts
Features
The JSM-IT800 incorporates our "In-lens Schottky Plus field emission electron gun" for high resolution imaging to fast elemental mapping, and an innovative electron optical control system "Neo Engine", as well as a system of seamless GUI "SEM Center" for fast elemental mapping with a fully embedded JEOL energy dispersive X-ray spectrometer (EDS), as a common platform.
The JSM-IT800 allows for the replacement of the objective lens of the SEM as a module, offering different versions to satisfy various users requirements. With the JSM-IT800, five versions are available with different objective lenses: a hybrid lens version (HL), which is a general-purpose FE-SEM; a super hybrid lens version (SHL/SHLs, two versions with different functions), which enables higher resolution observation and analysis; and the newly-developed semi-in-lens version (i/is, two versions with different functions), which is suited for the observation of semiconductor devices.
Furthermore, the JSM-IT800 can also be equipped with a new Scintillator Backscattered Electron Detector (SBED) and a Versatile Backscattered Electron Detector (VBED). The SBED enables the acquisition of images with high responsiveness and produces sharp material contrast even at a low accelerating voltage, while the VBED can help obtain images of 3D, topography and material contrasts. Thus, the JSM-IT800 can help users to obtain information that was not obtainable and to solve problems in measurement.
 

Semiconductor Equipment

Electron Beam Lithography System

Electron Beam Lithography System
Electronic devices such as computers, smartphones, and home appliances have semiconductor parts called LSIs (Large Scale Integration Circuits) built in. As miniaturization and density have progressed, the LSI circuits have come to be written with very fine patterns, and today they are as small as 10 nanometers (1/10,000th of a hair) or less.
Electron beam lithography systems are necessary to precisely process such extremely fine circuits.
As the demand for semiconductors further expands with the realization of the IoT society and the arrival of the 5G era, electron beam lithography systems are expected to play an increasingly important role.
Products
JBX-8100FS Series
Electron Beam Lithography System
JBX-9500FS
Electron Beam Lithography System
JBX-3200MV
Electron Beam Lithography System
JBX-3050MV
Electron Beam Lithography System
 

Electron Microscope for Semiconductor (TEM)

Electron Microscope for Semiconductor (TEM)
JEM-ACE200F High Throughput Analytical Electron Microscope

JEM-ACE200F High Throughput Analytical Electron Microscope

Electron Microscope for Semiconductor (SEM)
JSM-IT800 Schottky Field Emission Scanning Electron Microscope
 

Industrial Equipment

JAM-5200EBM
Electron Beam Metal AM Machine (3D Printer)
 

Thin Film Formation Equipment

Electron Beam Source／Bombardment Deposition Source (Vacuum Deposition)
TP-99260FDR Powder Feeder
BS/JEBG/EBG seriesElectron Beam Source
BS-60610BDSBombardment Deposition Source
BS-60250DEMElectron Beam Source
BS-60211DEM/BS-60210DEMElectron Beam Source
JST-F seriesElectron Beam Power Supply
JEBG series High-power electron beam sources
Plasma Source (Film Deposition Assist／Modification)
BS-80020CPPSPlasma Sourcefor Low-temperature Process
BS-80011BPGHigh-power Plasma Sourcefor high-density plasma
Crystal Oscillator Film-Thickness Controller (Measurement of Deposition Rate)
BS-04seriesRotary Sensor
Fine Powder Feeder (Film Formation such as Thermal Spray)
TP-99140FDR Fine Powder Feeder
 

Material Processing Equipment

Nanopowder Synthesis／Nanopowder Surface Improving
TP-99260FDR Powder Feeder
TP series RF Induction Thermal Plasma
TP-40020NPS Thermal Plasma Nanopowder Synthesis System
TP-99140FDR Fine Powder Feeder
Electron Beam Melting
JEBG series High-power electron beam sources
 

Electron Beam Metal AM Machine (3D Printer)

JAM-5200EBM
Electron Beam Metal AM Machine JAM-5200EBM
Main features
High-power Beam (maximum 6kW)
Long Life Cathode (1,500 hours or longer)
Powder dispersal prevention system "e-Shield"
Automatic Electron Beam Correction
Heating Capacity: 1,100℃ or higher
Remote Monitoring System
Long Life Cathode
"The Long Life Cathode, which lasts over 1,500 hours, can greatly reduce downtime for cathode replacement." The secret is JEOL's original vacuum technology, developed in the manufacturing of electron beam related equipment.
Helium-Free and powder dispersal prevention system
"e-Shield"
No helium gas is needed to prevent scattering of powder. JEOL's unique powder dispersal prevention system, e-Shield and JEOL’s scan strategy avoid Smoke phenomenon. Thanks to the helium-free environment, not only can parts be manufactured in a clean space at a low-cost, but "the surface of the cathode is also less susceptible to damage, allowing the electron beam to remain stable." As a result, the manufacturing quality can be maintained until the end of the cathode’s lifetime.
Automatic Electron Beam Correction
The focus and spot shape of the electron beam are automatically corrected according to the irradiation position by the technology developed in our electron beam lithography system for semiconductor manufacturing.
This enables high-quality and highly reproducible manufacturing in the whole building area.

Image of beam correction
(right: Corrected (JAM-5200EBM))
Remote Monitoring System
The manufacturing status and the machine conditions can be checked from a remote location at any time. An alarm notification function is also available.
Realization of an eco-friendly and sustainable society
With JEOL’s “Electron Beam Metal AM Machine”, you can build more than one part in a single printing process. Almost no cutting is required, preventing materials from being wasted.
Reusing metal powder is another possibility. Thus, JEOL is working on the realization of an eco-friendly and sustainable society.
Technical Data
JAM-5200EBM
Main Specifications
Manufacturing methodPowder Bed Fusion
ProcessHot process
Building dimensionsMaximum 250 mm (Dia.) × 400 mm (H)
Electron beam outputMax. 6 kW
Heating capabilityMax. 1,100℃ or higher
Cathode lifetime1,500 h or longer
Powder dispersal prevention unite-Shield
Inert gas
(for smoke prevention)Not required
Chamber pressure
(melting process)1×10-2 Pa or lower
Electron beam correctionAutomatic
(Focus, Astigmatism, Distortion)
Data formatSTL
Power supply3-phase, 200 V (±10％), 35 kVA
Weight4,900 kg
Dimensions
Unit: mm
Download Catalogue PDF
AM Samples
JAM-5200EBM
Low-pressure Turbine Blades for Jet Engine (Imitation)
Material: Ti-6Al-4V
Hight: 400 mm
12 pieces built simultaneously
Electron Source Chamber
（Right side: approx. 25% weight reduction）
Material: Ti-6Al-4V
Each size: 230 mm (Dia.) × 185mm (Height)
A small Sake Cup (190 pieces)
Material: Ti-6Al-4V
Height: 400 mm
Impeller
Material: Ni-based Superalloy 718
Diameter: 170 mm
Closed Impeller
Material: Ni-based Superalloy 718
Diameter: 100 mm
Built horizontally without angles
CAD data: Courtesy of The Barnes Global Advisors
Heatsink
Material: Pure Copper
Size: 100 mm×100 mm
 

Medical Equipment

Clinical Chemistry Analyzer (CA)
BioMajesty™ Series JCA-BM6070/C
BioMajesty™ ZERO series JCA-ZS050
BioMajesty™ series JCA-BM8000 series
BioMajesty™ Series JCA-BM6010/C